Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
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چکیده
منابع مشابه
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ژورنال
عنوان ژورنال: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
سال: 2018
ISSN: 0734-2101,1520-8559
DOI: 10.1116/1.5003361